Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-02-11
2010-11-09
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S319000, C430S311000
Reexamination Certificate
active
07829248
ABSTRACT:
The present disclosure provides a mask-pellicle system for lithography patterning. The mask-pellicle system includes a mask substrate; a predefined pattern formed on the transparent pattern; a pellicle configured approximate the transparent substrate; a pellicle frame designed to secure the pellicle; and a stress-absorbing feature configured between the pellicle frame and the mask substrate, to reduce stress of the mask substrate.
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Chinese Patent Office, Office Action issued Jun. 3, 2010, Application No. 200810135751.9, 4 pages.
Lee Hsin-Chang
Lin Burn Jeng
Yao Ming-Jiun
Alam Rashid
Haynes and Boone LLP
Rosasco Stephen
Taiwan Semiconductor Manufacturing Company , Ltd.
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