Pellicle for photolithographic mask

Details Pellicle for photolithographic mask Pellicle for photolithographic mask

1992-07-13

1994-02-15

Herbert, Jr., Thomas J.

Stock material or miscellaneous articles

Composite

Of polyisocyanurate

B32B 2700

Patent

active

052865673

ABSTRACT:
A pellicle for dust-proofing of a photolithographic mask used for patterning in the manufacturing process of semiconductor devices. The drawback due to dust deposition can be greatly decreased in the use of a pellicle made from a fluorocarbon resin which is a copolymer of tetrafluoroethylene and another fluorocarbon monomer capable of introducing a cyclic perfluoroether group into the molecule when the pellicle film is rendered antistatically hydrophilic, for example, by a plasma treatment.

REFERENCES:
patent: 4212918 (1980-07-01), Marquisee
patent: 4759990 (1988-07-01), Yen
patent: 4970099 (1990-11-01), Adams et al.

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