Pellicle for lithography

Details Pellicle for lithography Pellicle for lithography

2004-08-25

2009-10-20

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07604904

ABSTRACT:
There is disclosed a pellicle for lithography comprising a pellicle film, a pellicle frame to which the pellicle film is adhered, and a sticking layer placed on another end face of the pellicle frame, wherein the pellicle film consists of multi-layer structure of fluorine-doped silica and fluorocarbon resin. Thereby, there is provided a pellicle for lithography which has high transmittance and high light stability against light of short wavelength such as far-ultraviolet light in a range of 200-300 nm and especially vacuum ultraviolet light of 200 nm or less, and is sufficiently practicable.

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