Pellicle for lithography

Details Pellicle for lithography Pellicle for lithography

2006-06-27

2006-06-27

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07067222

ABSTRACT:
There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.

REFERENCES:
patent: 4861402 (1989-08-01), Gordon
patent: 6548129 (2003-04-01), Matsukura et al.
patent: 6593034 (2003-07-01), Shirasaki
patent: A 58-219023 (1983-12-01), None
patent: B2 2644457 (1997-05-01), None
patent: A 10-421 (1998-01-01), None
patent: B2 63-27707 (1998-06-01), None

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