Peeling solution for photo- or electron beam-sensitive resin

Details Peeling solution for photo- or electron beam-sensitive resin Peeling solution for photo- or electron beam-sensitive resin

1989-02-24

1991-08-06

Van Le, Hoa

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430309, 430325, 430329, 134 2, 252102, G03C 544

Patent

active

050377248

ABSTRACT:
The peeling solution for photo- or electron beam-sensitive resin according to the present invention consists of an aqueous solution consisting of hydrogen peroxide and a compound represented by the general formula (I) ##STR1## wherein R.sub.1 is H or an alkyl group of 1-2 carbon atoms, R.sub.2 is H or an alkyl group of 1-3 carbon atoms, and R.sub.3 is H or an alkyl group of 1-3 carbon atoms.

REFERENCES:
patent: 2898181 (1959-08-01), Dithman et al.
patent: 4900352 (1990-02-01), Wada et al.

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