Pedestal insulator for a pre-clean chamber

Details Pedestal insulator for a pre-clean chamber Pedestal insulator for a pre-clean chamber

1998-06-02

2000-06-20

Cano, Milton

Coating apparatus

Work holders, or handling devices

118728, 269 21, B05C 1302

Patent

active

060773537

ABSTRACT:
The invention generally provides an apparatus that reduces backside sputtering of the substrate in a pre-clean chamber and other etch chambers. The invention also provides an apparatus that reduces flaking of material from the film formed on the surfaces of the process kit and extends the specified lifetime of a process kit. One aspect of the invention provides an apparatus for supporting a substrate, comprising a support pedestal contacting a central portion of the substrate and an insulator surrounding the support pedestal, the insulator having a beveled portion extending from a circumferential edge of the substrate.

REFERENCES:
patent: 4793975 (1988-12-01), Draqge
patent: 5456757 (1995-10-01), Aruga et al.
patent: 5554266 (1996-09-01), Okamoto
patent: 5573596 (1996-11-01), Yin
patent: 5698070 (1997-12-01), Hirano et al.
patent: 5843237 (1998-12-01), Chun

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