Patterning method and methods for producing electro-optic...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging

Reexamination Certificate

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C430S311000, C430S320000, C430S322000

Reexamination Certificate

active

07604928

ABSTRACT:
A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas selected from the group consisting of hydrogen, deuterium, deuterated hydrogen, and tritium; partially exposing the treated surface to light to form an exposed region and an unexposed region; and applying a liquid onto one of the exposed region and the unexposed region.

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patent: WO 03/056622 (2003-07-01), None

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