Patterned thin SOI

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C438S282000, C257SE21122

Reexamination Certificate

active

07939387

ABSTRACT:
A process for treating a structure to prepare it for electronics or optoelectronics applications. The structure includes a bulk substrate, an oxide layer, and a semiconductor layer, and the process includes providing a masking to define on the semiconductor layer a desired pattern, and applying a thermal treatment for removing a controlled thickness of oxide in the regions of the oxide layer corresponding to the desired pattern to assist in preparing the structure.

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