Patterned polyimide film, a photosensitive polyamide acid deriva

Details Patterned polyimide film, a photosensitive polyamide acid deriva Patterned polyimide film, a photosensitive polyamide acid deriva

1986-05-01

1988-05-03

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430314, 430319, 430283, 430324, 430330, 204299R, G03C 500, B01D 1302, C25D 1300

Patent

active

047419881

ABSTRACT:
A method of manufacturing a polyimide pattern which is provided with a metal layer, such that a dual layer system is exposed in accordance with a certain pattern, which pattern contains a photosensitive polyamide acid derivative and a positive photoresist which is developed, provided with a metal layer and removed, after which, the polyamide acid derivative layer is developed and imidisied, as well as a new photosensitive polyamide acid derivative and an electrophoretic image-display cell.

REFERENCES:
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4123346 (1978-10-01), Ploix
patent: 4203106 (1980-05-01), Dalisa et al.
patent: 4620916 (1986-11-01), Zwemer et al.
patent: 4654223 (1987-03-01), Araps et al.
Liebert et al, "A 512 Character Electrophoretic Display", from Conference Record of 1980 Biennial Display Research Conference: Papers presented at Cherry Hill, N.J., Oct. 21-23, 1980.

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