Patterned mirror VCSEL with adjustable selective etch region

Details Patterned mirror VCSEL with adjustable selective etch region Patterned mirror VCSEL with adjustable selective etch region

1994-06-15

1996-09-17

Bovernick, Rodney B.

Coherent light generators

Particular active media

Semiconductor

372 43, 437228, H01S 319

Patent

active

055576265

ABSTRACT:
Patterned-mirrors for VCSELs are fabricated by forming a first mirror stack of a plurality of pairs of relatively high and low index of refraction layers, forming an active region of aluminum-free material on the first mirror stack, and forming a second mirror stack of a plurality of pairs of relatively high and low index of refraction layers. The second mirror stack includes first and second portions of materials selected to provide different rates of etching between the first and second portions. The second portion is selectively etched to the first portion by utilizing the first portion as an etch stop.

REFERENCES:
patent: 5206871 (1993-04-01), Deppe et al.
patent: 5245622 (1993-09-01), Jewell et al.
patent: 5258990 (1993-11-01), Olbright et al.
patent: 5314838 (1994-05-01), Cho et al.
patent: 5363393 (1994-11-01), Uomi et al.

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