Pattern width measuring apparatus, pattern width measuring...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S307000

Reexamination Certificate

active

06969853

ABSTRACT:
A pattern width measuring apparatus for accurately measuring pattern width of a pattern formed on a wafer using an electron beam. The pattern width measuring apparatus includes: an electron gun for generating the electron beam; a deflector for scanning the pattern with the electron beam by deflecting the electron beam; a first secondary electron detector and a second secondary electron detector for detecting secondary electrons generated when the electron beam is irradiated on the pattern; a first edge detector for detecting position of a first edge of the pattern based on the quantity of the secondary electrons detected by the first secondary electron detector; a second edge detector for detecting position of a second edge of the pattern based on the quantity of the secondary electrons detected by the second secondary electron detector; and a pattern width computing section for computing pattern width of the pattern based on the position of the first edge and the position of the second edge detected by the first edge detector and the second edge detector.

REFERENCES:
patent: 4874947 (1989-10-01), Ward et al.
patent: 5497034 (1996-03-01), Yamaguchi et al.
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5659172 (1997-08-01), Wagner et al.
patent: 5892224 (1999-04-01), Nakasuji
patent: 6172363 (2001-01-01), Shinada et al.
Y. Furuya, et al., “Model S-6000 Field Emission CD Measurement SEM” abstract of the 93rd Workshop of the 132nd Committee (Electron and Ion Beam Science and Technology) of Japan Society for the Promotion of Science, Nov. 8, 1985, pp. 1-5.
M. Miyoshi, et al., “Topographic Contrast in Scanning Electron Microscope During CD Measurement” abstract of the 93rd Workshop of the 132nd Committee (Electron and Ion Beam Science and Technology) of Japan Society for the Promotion of Science, Nov. 8, 1985, pp. 109-114.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pattern width measuring apparatus, pattern width measuring... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern width measuring apparatus, pattern width measuring..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern width measuring apparatus, pattern width measuring... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3511223

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.