Pattern transfer techniques for fabrication of lenslet arrays fo

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

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216 26, G03F 740

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056057830

ABSTRACT:
A method for forming lenslets which collect light and focuses it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate and forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer so that the mask pattern corresponds to lenslets to be formed, The method further includes anisotropically plasma etching the transparent lenslet-forming layer according to the thin etch-stop mask pattern, removing the thin etch-stop mask, and thermally reflowing the patterned transparent layer to form the transparent lenslets.

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patent: 5316640 (1994-05-01), Wakabayashi
Y. Ishihara et al., "A High Photosensitivity IL-CCD Image Sensor with Monolithic Resin Lens Array," International Electron Devices Meeting, 1983, pp. 497-500.
J. M. Moran and D. J. Maydan (Journal of Vacuum Science Technology, 1979, 16, pp. 1620-1624).
"Electronic and Photonic Properties of Polymers," M. J. Bowden and S. R. Turner, eds., American Chemical Society: Washington DC, 1988, pp. 158-166.

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