Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2005-06-14
2005-06-14
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S024000, C216S041000, C216S079000, C385S016000
Reexamination Certificate
active
06905614
ABSTRACT:
Described is a photolithography “pattern transfer” process for forming Micro-Electro-Mechanical Systems (MEMS) structures. A first material layer is patterned so that raised portions of the layer define features of a MEMS structure to be formed. The resulting pattern is then “transferred” to the surface of a second material layer by etching the top surface of the first material layer, including the raised portions and the valleys defined between the raised portions, until the second layer is exposed between the raised portions.
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Active Optical Networks, Inc.
Ahmed Shamim
Behiel Arthur J.
Silicon Edge Law Group LLP
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