Pattern transfer mask, mask inspection method and a mask inspect

Details Pattern transfer mask, mask inspection method and a mask inspect Pattern transfer mask, mask inspection method and a mask inspect

1997-10-15

1999-07-13

Anderson, Bruce

Radiant energy

Inspection of solids or liquids by charged particles

Electron microscope type

250397, H01J 37256

Patent

active

059230347

ABSTRACT:
A mask inspection apparatus of the present invention includes an electron gun for irradiating an electron beam onto a mask with a pattern formed thereon, an electron lens for magnifying an electro-optic mask image passed through the mask, a fluorescent screen for converting the magnified electro-optic mask image to an optical mask image, an optical lens for optically magnifying the optical mask image, a detector for detecting the magnified optical mask image, and a comparator for inspection a defect in the pattern on the basis of the image. By doing so, it is possible to suppress aberrations resulting from the electro-optic magnification and, in addition, inspect the pattern with a high resolution through optical magnification. It is also possible to inspect the mask at its area and to inspect a defect at high speeds.

REFERENCES:
patent: 4211924 (1980-07-01), Muller et al.
patent: 4514629 (1985-04-01), Smith et al.
patent: 4814615 (1989-03-01), Fushimi et al.
patent: 5051585 (1991-09-01), Koshishiba et al.
patent: 5457317 (1995-10-01), Yonehara et al.
patent: 5555315 (1996-09-01), Itakura
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5717204 (1998-02-01), Meisburger et al.
patent: 5717207 (1998-02-01), Koguchi et al.

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