Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-07-03
2007-07-03
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
11041216
ABSTRACT:
A pattern size correcting device includes: a testing photomask (1) having a test pattern; a quantifying unit (2) that quantifies, using the testing photomask (1), size variation in the test pattern as a function of distance and in relation to an open area ratio; an open area ratio calculating unit (3) that divides an exposure area having a plurality of actual device patterns into a plurality of correction areas and calculates the open area ratio of the respective correction areas; a data correcting unit (4) that inputs the open area ratio calculated by the open area ratio calculating unit (3) into a result of the quantification that uses the photomask (1), calculates size variations of the actual device patterns in the respective correction areas, and corrects design data of the actual device patterns based on the calculation; and a proximity effect correcting unit correcting a proximity effect. This correcting device enables quantitative estimation of size variation occurring in a pattern exposed in lithography and easy and accurate correction of pattern size based on the estimation.
REFERENCES:
patent: 5403088 (1995-04-01), Killmer et al.
patent: 6226034 (2001-05-01), Katayama
patent: 6281513 (2001-08-01), Takenaka
patent: 6436607 (2002-08-01), Lozes et al.
patent: 6610989 (2003-08-01), Takahashi
patent: 6677089 (2004-01-01), Ogino et al.
patent: 2001/0028983 (2001-10-01), Kawamura et al.
patent: 2002/0036273 (2002-03-01), Okino
patent: 2003/0048458 (2003-03-01), Mieher et al.
patent: 10-10701 (1998-01-01), None
patent: 11-102062 (1999-04-01), None
patent: 2000-75467 (2000-03-01), None
patent: 2000-323377 (2000-11-01), None
patent: 2003-100624 (2003-04-01), None
Tae Moon Jeong et al.,Flare in Microlithographic Exposure Tools, Japanese Journal of Applied Physics, vol. 41, No. 8, Aug. 2002.
Aoyama Hajime
Ogino Kozo
Osawa Morimi
Yao Teruyoshi
Dinh Paul
Memula Suresh
Westerman, Hattori, Daniels & Adrian , LLP.
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