Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1986-11-07
1989-01-17
Rosenberger, Richard A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
G01B 1100
Patent
active
047984708
ABSTRACT:
A pattern printing method includes a step of printing a pattern on a wafer on the basis of a target mark provided on the surface of the wafer which is opposite to the surface thereof on which the pattern is to be printed. Also disclosed is a pattern printing apparatus which comprises detecting means for detecting a target mark provided on the surface of a wafer which is opposite to the surface thereof on which a pattern is to be printed, and pattern printing means for printing the pattern on the pattern printing surface of the wafer on the basis of mark position data obtained by the detecting means.
REFERENCES:
patent: 4326805 (1982-03-01), Feldman et al.
patent: 4614433 (1986-09-01), Feldman et al.
Kawamura Yoshio
Kurosaki Toshiei
Moriyama Shigeo
Okazaki Shinji
Terasawa Tsuneo
Cooper Crystal
Hitachi , Ltd.
Rosenberger Richard A.
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