Pattern monitor mark and monitoring method suitable for...

Details Pattern monitor mark and monitoring method suitable for... Pattern monitor mark and monitoring method suitable for...

2008-02-26

2011-12-06

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S614000, C356S620000, C438S007000, C438S016000

Reexamination Certificate

active

08072601

ABSTRACT:
A method of forming a monitor mark includes forming an insulating film on a semiconductor substrate, and forming a first repetitive line pattern group and a second repetitive line pattern group by patterning the insulating film on the semiconductor substrate, such that the first repetitive line pattern group and the second repetitive line pattern group face each other with a predetermined space therebetween.

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patent: 2006-303022 (2006-11-01), None

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