Pattern measurement apparatus

Details Pattern measurement apparatus Pattern measurement apparatus

2008-08-08

2010-06-08

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S310000, C250S311000, C250S306000, C250S307000, C250S492200, C382S145000

Reexamination Certificate

active

07732792

ABSTRACT:
Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.

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