Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-08-02
2011-08-02
Werner, Brian P (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
Reexamination Certificate
active
07991218
ABSTRACT:
Solving means is configured of a signal input interface, a data calculation unit, and a signal output interface. The signal input interface allows image data which is obtained by photographing hole patterns, and CAD data which corresponds to hole patterns included in the image data, to be inputted. The data calculation unit includes: CAD hole-pattern central-position detection means which detects central positions respectively of hole patterns included in the CAD data from the CAD data, and which generates data which represents, with an image, the central positions of the respective hole patterns; pattern extraction means which extracts pattern data from the image data; image hole-pattern central-position detection means which detects central positions of the respective hole patterns in the image data from the pattern data, and which generates data which represents, with an image, the central positions of these hole patterns detected from the image data; and collation process means which detects positional data in the image data corresponding to that in the CAD data through a process of collating the CAD hole-pattern central-position data with the image hole-pattern central-position data. The signal output interface outputs the positional data outputted from the data calculation unit.
REFERENCES:
patent: 4379308 (1983-04-01), Kosmowski et al.
patent: 5111406 (1992-05-01), Zachman et al.
patent: 6366688 (2002-04-01), Jun et al.
patent: 7031511 (2006-04-01), Asai
patent: 05-206238 (1993-08-01), None
patent: 7-260699 (1995-10-01), None
patent: 11-070922 (1999-03-01), None
patent: 2000-236007 (2000-08-01), None
patent: 2000-293690 (2000-10-01), None
patent: 2001-082931 (2001-03-01), None
patent: 2002-358509 (2002-12-01), None
patent: 2006-126532 (2006-05-01), None
Japanese Office Action issued in Japanese Patent Application No. JP 2005-314853 dated Oct. 5, 2010.
Lecture 10: Hough Circle Transform, Harvy Rhody, Chester F. Carlson Center for Imaging Science, Rochester Institute of Technology, Oct. 11, 2005.
Japanese Office Action issued in Japanese Patent Application No. JP 2005-314853 dated Mar. 1, 2011.
Matsuoka Ryoichi
Sutani Takumichi
Toyoda Yasutaka
Hitachi High-Technologies Corporation
McDermott Will & Emery LLP
Werner Brian P
LandOfFree
Pattern matching apparatus and semiconductor inspection... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern matching apparatus and semiconductor inspection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern matching apparatus and semiconductor inspection... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2772921