Pattern layout and layout data generation method

Details Pattern layout and layout data generation method Pattern layout and layout data generation method

2006-10-30

2009-02-17

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C257S499000

Reexamination Certificate

active

07493582

ABSTRACT:
A transistor layout including a diffusion region and a gate line. The gate line intersects part of the diffusion region in an overlapping manner. The layout includes an L-shaped bent portion included in the diffusion region. An auxiliary pattern is included in the diffusion region opposite to the L-shaped bent portion so that the gate line is located between the L-shaped bent portion and the auxiliary pattern. The auxiliary pattern and the L-shaped bent portion are spaced from the gate line by the same distance.

REFERENCES:
patent: 5847421 (1998-12-01), Yamaguchi
patent: 5850093 (1998-12-01), Tarng et al.
patent: 6194252 (2001-02-01), Yamaguchi
patent: 6235575 (2001-05-01), Kasai et al.
patent: 2001/0009291 (2001-07-01), Miles
patent: 2002/0079551 (2002-06-01), Hokazono
patent: 2004/0235229 (2004-11-01), Hokazono
patent: 2006/0006437 (2006-01-01), Song et al.
patent: 2007/0257331 (2007-11-01), Kurjanowicz et al.
patent: 60-202343 (1985-10-01), None
patent: 62052974 (1987-03-01), None
patent: 64-053575 (1989-03-01), None
patent: 02309665 (1990-12-01), None
patent: 07142726 (1995-06-01), None
patent: 08078684 (1996-03-01), None
patent: 10200097 (1998-07-01), None
patent: 2000040758 (2000-02-01), None
patent: 2002305302 (2002-10-01), None
patent: 2004342730 (2004-12-01), None

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