Pattern inspection system

Details Pattern inspection system Pattern inspection system

1982-09-30

1985-10-15

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

250563, 250572, 356237, 356384, 356387, 382 22, 382 41, 382 68, G06K 900

Patent

active

045478953

ABSTRACT:
A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.

REFERENCES:
patent: 3624606 (1971-11-01), Lefevre
patent: 4392120 (1983-07-01), Mita et al.

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