Pattern inspection method and apparatus using electron beam

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S311000

Reexamination Certificate

active

07439504

ABSTRACT:
A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary particles emanated from the surface of the specimen by the irradiation, signals outputted from each sensor of the plural sensors which simultaneously detect the secondary particles are added, an image of the surface of the specimen on which the pattern is obtained from the added signals, and the image is processed to detect a defect of the pattern.

REFERENCES:
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5892224 (1999-04-01), Nakasuji
patent: 6172363 (2001-01-01), Shinada et al.
patent: 7135676 (2006-11-01), Nakasuji et al.
patent: 2000-188310 (2000-07-01), None
patent: 2000-252330 (2000-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Pattern inspection method and apparatus using electron beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern inspection method and apparatus using electron beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection method and apparatus using electron beam will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4015459

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.