Pattern inspection method

Details Pattern inspection method Pattern inspection method

1986-04-11

1988-10-04

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

382 34, G06K 964

Patent

active

047760230

ABSTRACT:
Two kinds of image corresponding to a reference pattern and a pattern to be inspected are converted into binary images and local images cut out from the binary images are compared with each other to detect differences between the cut out images and recognize these differences as a defect. One of the main subjects of the inspecting method is to moderate excess sensitivity to the different portions to the extent of allowing non-serious actual defects. By setting don't care areas each of which consists of one pixel row neighboring on a binary boundary line in the image, and comparing the remaining portions of the images other than the don't care areas by logical processing it is possible to detect various defects without regarding the quantization error as a defect.

REFERENCES:
patent: 4010446 (1977-03-01), Kawa
patent: 4578765 (1986-03-01), Barker
patent: 4614430 (1986-09-01), Hara et al.
patent: 4623256 (1986-11-01), Ikenaga et al.
patent: 4628531 (1986-12-01), Okamoto et al.
patent: 4648053 (1987-03-01), Fridge
patent: 4651341 (1987-03-01), Nakashima et al.
patent: 4668982 (1987-05-01), Tinnerino
Hara et al, "Automatic Visual Inspection of LSI Photomasks", 5th Int. Conf. on Pattern Recognition, Dec. 1980, pp. 273-279.
Okamoto et al, "An Automatic Visual Inspection System for LSI Photomasks", 7th Int. Conf. on Pattern Recognition, Jul.-Aug. 1984, pp. 1361-1364.

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