Pattern inspection apparatus and method

Details Pattern inspection apparatus and method Pattern inspection apparatus and method

2008-09-18

2011-12-13

Kassa, Yosef (Department: 2624)

Image analysis

Image sensing

Sensor control

C382S103000, C382S190000, C382S278000

Reexamination Certificate

active

08078012

ABSTRACT:
A pattern inspection apparatus includes a stage configured to mount a target workpiece to be inspected thereon, a sensor configured to include a plurality of light receiving elements arrayed in a second direction orthogonal to a first direction which moves relatively to the stage, and to capture optical images of the target workpiece by using the plurality of light receiving elements, an accumulation unit configured to accumulate each pixel data of the optical images overlappingly captured by the sensor at positions shifted each other in the second direction by a pixel unit, for each pixel, and a comparison unit configured to compare the each pixel data accumulated for each pixel with predetermined reference data.

REFERENCES:
patent: 4999495 (1991-03-01), Miyata et al.
patent: 5650614 (1997-07-01), Yasutake et al.
patent: 6011625 (2000-01-01), Glass
patent: 6590703 (2003-07-01), Park et al.
patent: 7260980 (2007-08-01), Adams et al.
patent: 2007-102153 (2007-04-01), None
U.S. Appl. No. 12/552,108, filed Sep. 1, 2009, Tsuchiya, et al.

Affiliated with

Also associated with

Rating

Pattern inspection apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern inspection apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4293834