Pattern inspection apparatus and method

Details Pattern inspection apparatus and method Pattern inspection apparatus and method

2008-11-19

2011-10-04

Toatley, Gregory J (Department: 2877)

Image analysis

Applications

Manufacturing or product inspection

C382S145000, C382S194000

Reexamination Certificate

active

08031932

ABSTRACT:
A pattern inspection apparatus includes a stage configured to mount thereon a target workpiece to be inspected where patterns are formed, at least one sensor configured to move relatively to the stage and capture optical images of the target workpiece to be inspected, a first comparing unit configured to compare first pixel data of an optical image captured by one of the at least one sensor with first reference data at a position corresponding to a position of the first pixel data, and a second comparing unit configured to compare second pixel data of an optical image captured by one of the at least one sensor at a position shifted by a sub-pixel unit from the position where the optical image of the first pixel data is captured, with second reference data at a position corresponding to the position of the second pixel data.

REFERENCES:
patent: 4740708 (1988-04-01), Batchelder
patent: 4805123 (1989-02-01), Specht et al.
patent: 5754678 (1998-05-01), Hawthorne et al.
patent: 6285783 (2001-09-01), Isomura et al.
patent: 7176433 (2007-02-01), Rosengaus
patent: 7263216 (2007-08-01), Shishido et al.
patent: 7359043 (2008-04-01), Tsuchiya et al.
patent: 7474395 (2009-01-01), Nelson et al.
patent: 10-104168 (1998-04-01), None
patent: 2004-212221 (2004-07-01), None
U.S. Appl. No. 12/212,958, filed Sep. 18, 2008, Takayuki Abe et al.

Affiliated with

Also associated with

Rating

Pattern inspection apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern inspection apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4288692