Pattern forming process and thin-film magnetic head formed by sa

Details Pattern forming process and thin-film magnetic head formed by sa Pattern forming process and thin-film magnetic head formed by sa

1988-05-25

1989-09-05

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156652, 156655, 156656, 1566591, 1566611, 156662, 156667, 156904, 360122, 427 38, 427130, 427131, 428694, 20419232, B44C 122, C23F 102, C03C 1500, C03C 2506

Patent

active

048635570

ABSTRACT:
Disclosed herein are a pattern forming process, particularly the one by lithography for fine fabrication, and a thin-film magnetic head formed by said process. The present invention provides a process for accurately fabricating a substrate having a stepped surface by dry etching, using as the mask a resist film formed by plasma polymerization. Plasma polymerization forms a uniform photosensitive resist film on a stepped surface, and the resist film can be used as the mask for the ion milling of the substrate.

REFERENCES:
patent: 4599137 (1986-07-01), Akiya
patent: 4613398 (1986-09-01), Chiong et al.
patent: 4677036 (1987-06-01), Nakamura et al.
patent: 4780354 (1988-10-01), Nakayama et al.

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