Pattern forming process and process for preparing semiconductor

Details Pattern forming process and process for preparing semiconductor Pattern forming process and process for preparing semiconductor

1993-01-29

1994-09-06

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156656, 156657, 156662, 1566591, 156345, H01L 21306, B44C 122, C23F 100

Patent

active

053445228

ABSTRACT:
A process for forming an etching pattern, which includes selectively irradiating a light to a clean surface of a material to be worked by etching so as to form radicals from a photoradical forming substance in an atmosphere of the substance, forming a modified portion having an etching resistance at a photo-irradiated portion of the surface, and then subjecting an unmodified portion of the surface of the material to be worked to an etching treatment, thereby forming an etching pattern corresponding to a pattern formed by the irradiation.

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