Pattern forming process

Details Pattern forming process Pattern forming process

2006-07-04

2006-07-04

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S313000, C430S320000, C430S322000, C430S325000, C430S905000

Reexamination Certificate

active

07070905

ABSTRACT:
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

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