Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-10-24
2008-12-02
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S394000, C430S005000, C430S322000, C430S313000, C430S323000, C430S330000
Reexamination Certificate
active
07459265
ABSTRACT:
First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to obtain a resist pattern. A mask for the first exposure process is such that a light blocking pattern is formed on the whole surface of a standard-pattern mask part corresponding to the standard-pattern forming region. A mask for the second exposure is such that a light blocking pattern is formed on the whole surface of a grating-pattern mask part corresponding to the grating-pattern forming region.
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Ishibashi Takeo
Itoh Maya
Nakao Shuji
Saito Takayuki
Huff Mark F
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Renesas Technology Corp.
Sullivan Caleen O
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