Pattern forming method, mask manufacturing method, and LSI...

Details Pattern forming method, mask manufacturing method, and LSI... Pattern forming method, mask manufacturing method, and LSI...

2008-03-18

2008-03-18

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07346882

ABSTRACT:
A pattern forming method includes the steps of checking a wide range size change characteristic for each device in a case of using a device group used for forming a pattern; dividing a design pattern size into a smaller area than a standard distance to which a predetermined size change is caused, when the pattern is formed on a sample by using the device group; acquiring correction information of the size of the pattern of each the small area by using the size change characteristic; and forming a desired pattern based on the acquired correction information.

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