Pattern forming method by use of X-ray exposure

Details Pattern forming method by use of X-ray exposure Pattern forming method by use of X-ray exposure

1987-10-15

1989-06-20

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430296, 430311, 430325, 430326, 430966, 430967, 430924, G03C 1495, G03C 500

Patent

active

048408727

ABSTRACT:
A pattern forming method in which a water-soluble organic film absorbing secondary electrons or soft X-rays is formed on a resist layer and thereafter, pattern exposure, development are carried out. The water-soluble organic film containing halogen, sulfur, metal atom, etc. absorbs secondary electrons or soft X-rays which are generated from a mask in X-rays exposure so that only X-rays passed through openings of the mask are applied to a resist layer and a super fine pattern of high aspect ratio can be obtained.

REFERENCES:
patent: 4061829 (1977-12-01), Taylor
patent: 4201580 (1980-05-01), Feit
patent: 4262073 (1981-04-01), Pampalone et al.
patent: 4287277 (1981-09-01), Matsumoto et al.
patent: 4461825 (1984-07-01), Kato et al.
patent: 4746596 (1988-05-01), Yoshioka et al.

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