Pattern forming method and pattern forming apparatus

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

Reexamination Certificate

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Details

C427S008000, C427S097100, C427S256000

Reexamination Certificate

active

07572481

ABSTRACT:
A pattern forming method, for laminating a layer of a pattern on a base by supplying to the base a material for forming the pattern from a supply section for supplying the material based on information of the pattern, comprises the step of adjusting a relative positional relation between a forming surface to which the layer of the pattern is formed and the supply section with respect to a direction in which the pattern is laminated, by using the information.

REFERENCES:
patent: 6561607 (2003-05-01), Lubinsky et al.
patent: 6758550 (2004-07-01), Ito et al.
patent: 6815001 (2004-11-01), Mishima et al.
patent: 1-303787 (1989-12-01), None
patent: 2-162789 (1990-06-01), None
patent: 4-223390 (1992-08-01), None
patent: 5-211383 (1993-08-01), None
patent: 8-80655 (1996-03-01), None

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