Pattern forming method

Details Pattern forming method Pattern forming method

1985-07-02

1988-06-14

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Simultaneous developing a resist image and etching a subtrate

430281, 430286, 430287, 430291, 430296, 430323, 430288, 430324, 430326, 430331, G03F 716, G03F 726, G03C 168, G03C 172

Patent

active

047511710

ABSTRACT:
A method of forming any film pattern on an arbitrary substrate, more particularly, a pattern forming method which comprises selectively forming a film on an arbitrary substrate, by use of chemical reaction, and further, a method of forming a pattern of an organic film by selectively removing the organic film at a lower layer, with the pattern of the Langmuir-Blodgett's film containing Si as a mask.

REFERENCES:
patent: 3652274 (1972-03-01), Verelst et al.
patent: 3936307 (1976-02-01), Osakawa et al.
patent: 4301231 (1981-11-01), Atarashi et al.
patent: 4374193 (1983-02-01), Moriya et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4507384 (1985-03-01), Morita et al.
patent: 4564576 (1986-01-01), Saigo et al.

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