Pattern forming method

Details Pattern forming method Pattern forming method

1986-07-15

1987-12-29

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156657, 1566591, 427 431, 427 541, B44C 122, B05D 306

Patent

active

047159294

ABSTRACT:
Method of forming any film pattern on an arbitrary substrate, more particularly, a pattern forming method which comprises selectively forming a film on an arbitrary substrate, by use of chemical vapor reaction, and further, a method of forming the pattern of an organic film by selectively removing the organic film at a lower layer, using the pattern of the Langmuir-Blodgett's film or chemical adsorption film containing Si as a mask.

REFERENCES:
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 3825466 (1974-07-01), Martin
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4539061 (1985-09-01), Sagiv

Affiliated with

Also associated with

Rating

Pattern forming method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern forming method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern forming method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-461622