Pattern forming method

Details Pattern forming method Pattern forming method

1985-02-15

1986-05-06

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156656, 156657, 156662, 156667, 252 792, 252 793, 427264, C23F 100, H01L 21306, B44C 122, C03C 1500

Patent

active

045869804

ABSTRACT:
A pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.

REFERENCES:
patent: 4119483 (1978-10-01), Hubsch et al.
patent: 4502914 (1985-03-01), Trumpp et al.

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