Pattern forming method

Details Pattern forming method Pattern forming method

1986-05-05

1987-09-01

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430 22, 430323, 430329, 430394, G03C 500, G03F 900

Patent

active

046908803

ABSTRACT:
A method of forming a pattern on a surface of a workpiece. The workpiece surface is coated with photoresist. Part of the coated workpiece surface is exposed and developed to form an alignment mark. An unexposed portion of the photoresist coated workpiece surface is then exposed, developed and etched.

REFERENCES:
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4367281 (1913-01-01), Shibayama et al.
patent: 4377627 (1983-03-01), Vinton
patent: 4436806 (1984-03-01), Rendulic et al.
patent: 4508802 (1985-04-01), Heiart et al.
patent: 4518667 (1985-05-01), Heiart et al.
patent: 4522903 (1985-06-01), Heiart et al.

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