Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-09-05
2010-02-16
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S270100, C430S271100, C430S281100, C430S284100, C430S523000, C430S527000, C430S533000, C430S913000
Reexamination Certificate
active
07662540
ABSTRACT:
The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capable of forming a fine and precise pattern; a pattern forming apparatus provided with the pattern forming material; and a pattern forming process using the pattern forming material.To this end, the present invention provides a pattern forming material having a support, a photosensitive layer, and a protective film, the photosensitive layer and the protective film being formed in this order on the support, wherein the number of fish-eyes each having an area of 2,000μm2or more and a maximum height measured from the film surface of 1μm to 7μm residing in the protective film is 50/m2to 1,000/m2.
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Serizawa Shinichiro
Takashima Masanobu
FUJIFILM Corporation
Sughrue & Mion, PLLC
Walke Amanda C.
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