Pattern forming material including photoacid and photobase gener

Details Pattern forming material including photoacid and photobase gener Pattern forming material including photoacid and photobase gener

1996-03-29

1997-11-25

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

4302701, 430919, 430920, 430921, 522 25, 522 26, 522 27, 522 28, G03C 154, G03C 156, G03C 1685

Patent

active

056911009

ABSTRACT:
A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.

REFERENCES:
patent: 5110708 (1992-05-01), Kim
patent: 5262280 (1993-11-01), Knudsen et al.
patent: 5286602 (1994-02-01), Pawlowski et al.
Winkle et al., Acid Hardening Positive Photoresist using Photochemical Generation of Base, J. of Photopolymer Sci. & Tech. vol. 3, Nov. 1990 pp. 419-422.

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