Pattern forming material and process for forming pattern using t

Details Pattern forming material and process for forming pattern using t Pattern forming material and process for forming pattern using t

1990-03-14

1992-06-02

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430280, 430921, 430326, 522 46, 522 59, G03C 173, G03F 738, G03F 739

Patent

active

051185822

ABSTRACT:
A pattern can be formed on a substrated using a pattern forming material comprising (a) a medium, e.g. a polymer or compound, having reactivity for changing solubility in an alkali aqueous solution by a reaction using an acid as a catalyst, and (b) as an acid precursor an alkylsulfonic acid ester obtained from a compound having at least two phenolic hydroxyl groups.

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patent: 3782939 (1974-03-01), Bonham
patent: 3852771 (1974-12-01), Ross et al.
patent: 4464458 (1984-08-01), Chow et al.
patent: 4755541 (1988-07-01), LiBassi et al.
patent: 4857435 (1989-08-01), Hopf et al.
patent: 4871645 (1989-10-01), Uenishi et al.
patent: 5015554 (1991-05-01), Ruckert et al.
patent: 5023164 (1991-06-01), Brunsvold et al.

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