Pattern-forming material and its production and use

Details Pattern-forming material and its production and use Pattern-forming material and its production and use

1987-03-16

1989-09-05

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430325, 430296, 430312, 430313, 430327, 430271, 430287, 156643, 528 10, G03C 171, C08G 7700

Patent

active

048638331

ABSTRACT:
A high-energy radiation-sensitive pattern-forming resist material consisting of polysilsesquioxane having no hydroxyl group in its molecule. The pattern-forming material of this invention has an improved sensitivity to high-energy radiation exposure, a high resistance to dry etching, a high resolution capability, and an improved thermal stability.

REFERENCES:
patent: 4600685 (1986-07-01), Kitakohji et al.
International Polymer Science and Technology, vol. 8, No. 9, 1981, pp. T51-T53, Shawbury, Shrewsbury, GB; T. V. Vasil Eva et al.: "Influence of the Conditions of Continuous Hydrolysis of Methyltrichlorosilane on the Composition of the Reaction Products", p. T51, col. 2, lines 2-15; p. T52, formulas.
Patents Abstracts of Japan, vol. 6, No. 245 (P-159) [1123], 3rd Dec. 1982; & JP-A-57 141 642 (Fujitsu K.K.) 02-09-1982.
Patents Abstracts of Japan, vol. 6, No. 245 (P-159) [1123], 3rd Dec. 1982; & JP-n A-57 141 641 (Fujitsu K.K.) 02-09-1982.

Affiliated with

Also associated with

Rating

Pattern-forming material and its production and use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern-forming material and its production and use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern-forming material and its production and use will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-243030