Pattern forming apparatus

Details Pattern forming apparatus Pattern forming apparatus

1982-03-15

1984-11-06

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 52, G03B 2752, G03B 2768

Patent

active

044809107

ABSTRACT:
There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

REFERENCES:
patent: 2073287 (1937-03-01), Sandvik
patent: 3115815 (1963-12-01), Friedel
patent: 3473874 (1969-10-01), Hall et al.
patent: 3554641 (1971-01-01), Jeffee et al.
patent: 3614223 (1971-10-01), Ott
patent: 3648587 (1972-03-01), Stevens
patent: 3794421 (1974-02-01), Kano et al.
patent: 3893763 (1975-07-01), Ott
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4209250 (1980-06-01), James et al.
"Reduction of Waste Resulting from Mask Defects," Solid State Technology, Aug. 1978, G. W. W. Stevens, pp. 68-70.

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