Pattern forming apparatus using quadrupole lenses

Details Pattern forming apparatus using quadrupole lenses Pattern forming apparatus using quadrupole lenses

1976-05-19

1978-02-21

Church, Craig E.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 250492A, H01J 314

Patent

active

040754880

ABSTRACT:
Disclosed is a pattern forming apparatus using a quadrupole lens system to control the cross section of a beam of electrons or ions to be projected onto a plate-like object. A variety of rectangular beams can be formed by electrically controlling the quadrupole lens system, and thus a desired pattern can be produced in the form of combination of rectangle and line pattern elements when the plate-like object is exposed to the beam of electric charged particles. The pattern forming apparatus according to this invention is useful particularly in fabricating integrated circuits, semiconductor devices and other precision devices.

REFERENCES:
patent: 2919381 (1959-12-01), Glaser
patent: 3118050 (1964-01-01), Hetherington
patent: 3201631 (1965-08-01), Gale
patent: 3547074 (1970-12-01), Hirschfeld
patent: 3956635 (1976-05-01), Chang

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