Pattern forming and etching process using radiation sensitive ne

Details Pattern forming and etching process using radiation sensitive ne Pattern forming and etching process using radiation sensitive ne

1985-10-15

1986-06-03

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430270, 430310, 430314, 430325, 526284, G03C 500

Patent

active

045929939

ABSTRACT:
A process for fabrication of resist comprising a substrate and an overlying radiation sensitive layer, said overlying layer consisting essentially of a specific polymer or copolymer of vinylnaphthalene.

REFERENCES:
patent: 3162532 (1964-12-01), Hoegl et al.
patent: 3164575 (1965-01-01), Welch et al.
patent: 3817957 (1974-06-01), Trepka
patent: 4208211 (1980-06-01), Bowden et al.
Imamura, J. Electrochem. Soc., vol. 126, No. 9, 9/1979, pp. 1628-1630.
Gokan et al., J. Electrochem. Soc., vol. 130, No. 1, 1/1983, pp. 143-146.
Thompson et al., J. Vac. Sci. Technol. 15(3), May/Jun. 1978, pp. 938-943.
Thompson et al., J. Electrochem. Soc., vol. 126, No. 10, pp. 1699-1702; 1703-1708, 10/1979.

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