Pattern formation method through liquid immersion lithography

Details Pattern formation method through liquid immersion lithography Pattern formation method through liquid immersion lithography

2005-08-15

2008-12-30

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

C430S309000, C430S311000, C430S322000, C430S330000, C430S945000

Reexamination Certificate

active

07470501

ABSTRACT:
An exposure system includes an exposure section provided within a chamber for irradiating a resist film formed on a wafer with exposing light through a mask with an immersion liquid provided on the resist film. It further includes a drying section for drying the surface of the resist film after the irradiation.

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Tanaka et al “Freeze-Dryining Process to Avoid Resist Pattern collapse” Jpn J. Phys. vol. 32 (1993) pp. 5813-5814, Part 1, No. 12A, Dec. 1993.

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