Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-03-16
2010-02-02
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S322000, C430S961000
Reexamination Certificate
active
07655385
ABSTRACT:
After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.
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Switkes, M., et al., “Resolution Enhancement of 157 nm Lithography by Liquid Immersion”, Proceedings of SPIE, Mar. 5, 2002, vol. 4691, pp. 459-465, SPIE, United States.
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Endo Masayuki
Sasago Masaru
Duda Kathleen
McDermott Will & Emery LLP
Panasonic Corporation
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