Pattern formation method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S322000, C430S961000

Reexamination Certificate

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07655385

ABSTRACT:
After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.

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Japanese Office Action, with English translation, issued in Japanese Patent Application No. JP 2003-177884, mailed Oct. 30, 2007.
Switkes, M., et al., “Resolution Enhancement of 157 nm Lithography by Liquid Immersion”, Proceedings of SPIE, Mar. 5, 2002, vol. 4691, pp. 459-465, SPIE, United States.
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