Pattern formation method

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Reexamination Certificate

active

07618754

ABSTRACT:
The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting property against the exposing light and surrounded with the semi-shielding portion, and an auxiliary pattern surrounded with the semi-shielding portion and provided around the transparent portion. The semi-shielding portion and the transparent portion transmit the exposing light in an identical phase with respect to each other. The auxiliary pattern transmits the exposing light in an opposite phase with respect to the semi-shielding portion and the transparent portion and is not transferred through exposure.

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patent: 7060398 (2006-06-01), Misaka
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patent: 2003/0203290 (2003-10-01), Misaka
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patent: 2004/0121244 (2004-06-01), Misaka
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patent: 11-143047 (1999-05-01), None
patent: 2000-019710 (2000-01-01), None
patent: 2003-203290 (2003-10-01), None
patent: 2003-203291 (2003-10-01), None
patent: 2004-121244 (2004-06-01), None

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