Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2008-07-01
2008-07-01
Whitehead, Jr., Carl (Department: 2813)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S128000, C438S552000, C438S598000, C438S599000, C438S669000, C438S671000, C430S302000, C430S312000, C430S313000, C430S317000
Reexamination Certificate
active
07393794
ABSTRACT:
After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.
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Endo Masayuki
Sasago Masaru
Jr. Carl Whitehead
Matsushita Electric - Industrial Co., Ltd.
McDermott Will & Emery LLP
Mitchell James M.
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