Pattern formation material and pattern formation method

Details Pattern formation material and pattern formation method Pattern formation material and pattern formation method

2005-08-30

2005-08-30

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S914000, C430S919000, C430S320000

Reexamination Certificate

active

06936401

ABSTRACT:
The pattern formation material of this invention is a chemically amplified resist material including a polymer whose solubility in a developer is changed in the presence of an acid; an acid generator for generating an acid through irradiation with exposing light; and a base generator for generating a base through irradiation with the exposing light. The base generator is more photosensitive to longer band light of a wavelength longer than extreme UV than to extreme UV when irradiated, as the exposing light, with the extreme UV and the longer band light at equivalent exposure energy.

REFERENCES:
patent: 5650261 (1997-07-01), Winkle
patent: 6395451 (2002-05-01), Jung et al.
patent: 2004/0259040 (2004-12-01), Endo et al.
patent: WO 00/17712 (2000-03-01), None
Shirai et al., “Photoacid and photobase generators: Chemistry and applications to polymeric materials”, Progress in Polymer Science, vol. 21, Issue 1, 1996, pp. 1-45.
Wright et al., “Positive and Negative Tone Protein Patterning on a Photobase Gernerating Polymer”, Langmuir, 2003, vol. 19, pp. 446-452.

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