Pattern defect inspection method and apparatus thereof

Details Pattern defect inspection method and apparatus thereof Pattern defect inspection method and apparatus thereof

2006-06-09

2009-06-16

Vanore, David A (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S307000, C250S306000, C250S492100, C250S311000, C250S559070, C250S492200, C324S754120, C324S756010, C356S401000, C356S237500, C430S030000

Reexamination Certificate

active

07547884

ABSTRACT:
In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam. Further, a beam forming slit is disposed ahead of an electrification control slit, thus the electrification control slit is prevented from being irradiated with an electron beam for preliminary electrification, and thereby secondary electrons which disturb the control of the electrification are inhibited from being generated. The shape of the slit is designed so that the strength of an electron beam may gradually decrease toward both the ends of an electron beam irradiation region in the longitudinal direction thereof. Furthermore, a preliminary static eliminator to remove or reduce the unevenness in an electrification potential distribution which has undesirably been formed earlier is disposed.

REFERENCES:
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patent: 6797954 (2004-09-01), Shinada et al.
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patent: 2003/0127593 (2003-07-01), Shinada et al.
patent: 2005/0190310 (2005-09-01), Koyama et al.
patent: 2005-164451 (2003-12-01), None

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