Image analysis – Histogram processing – For setting a threshold
Patent
1985-04-08
1988-03-15
Boudreau, Leo H.
Image analysis
Histogram processing
For setting a threshold
250562, 356237, G06K 900
Patent
active
047318554
ABSTRACT:
A pattern defect inspection apparatus detects presence or absence of a defect in a pattern formed on a semiconductor wafer by scanning the pattern normally to the surface thereof by a coherent light beam of a predetermined spot size, detecting reflected diffraction lights generated thereby and processing the detected lights. It comprises an abnormal direction signal detector including photo-detectors having wide light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from a normal pattern do not normally reach, a normal pattern detector including photo-detectors having large light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from the normal pattern reach, and a defect discriminator for determining if the abnormal direction signals are due to a true defect or not in accordance with the signals from the abnormal direction signal detector and the normal pattern detector.
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Hase Shinobu
Ito Yoshitoshi
Kimura Shigeharu
Kinameri Kanji
Munakata Chusuke
Boudreau Leo H.
Hitachi , Ltd.
Mancuso Joseph
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